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        HIGH THROUPUT MACRO DEFECT INSPECTION

        MueTec’s mask inspection is using a die-to-die approach to detect statistical failures on the mask. This tool is used to monitor the masks in wafer manufacturing, typically in power semiconductor, LED and MEMS manufacturing.

        Our tool helps the customer to automatically decide if the photomask is good, requires cleaning or needs to be replaced.


        PRODUCTS
        • Spector
          Automatic and fully enclosed with FFU
          Spector

          Typical Application

          Mask defect inspection


          Key Features

          Fully enclosed tool architecture

          Robot handling of masks with up to 2 pod or cassette stations

          Automatic inspection based on die-to-die comparison

          Resolution of 0,5 μ/pixel

          Defect sizes as of 1 μm

          Mask sizes up to 14’’

        • Spector A
          Automatic with mask robot and mask carriers
          Spector A

          Typical Application

          Mask defect inspection


          Features

          Open tool architecture

          Robotor mask loading and unloading

          Fully automatic mask inspection

          Automatic inspection based on die-to-die comparison

          Resolution as of 0,5 μ/pixel

          Defect sizes as of 1 μm

          Mask sizes up to 14’’

        • Spector M
          Semi Automatic
          Spector M

          Typical Application

          Mask defect inspection


          Features

          Open tool architecture

          Manual operator mask loading and unloading

          Automatic inspection based on die-to-die comparison

          Resolution as of 0,5 μ/pixel

          Defect sizes as of 1 μm

          Mask sizes up to 14’’

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